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胡衍雷

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Discipline:Precision Instrument and Machinery
Mechanical Engineering

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An improved multi-exposure approach for high quality holographic femtosecond laser patterning

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Impact Factor:3.597

DOI number:10.1063/1.4902925

Journal:APPLIED PHYSICS LETTERS

Correspondence Author:huyanlei

Document Code:000346265200004

Volume:105

Issue:22

ISSN No.:0003-6951

Translation or Not:no

Date of Publication:2014-12-01

Included Journals:SCI

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